ASML, oo ah hogaamiyaha caalamiga ah ee nidaamyada lithography semiconductor, ayaa dhawaan ku dhawaaqay horumarinta tignoolajiyada cusub ee ultraviolet (EUV). Tiknoolajiyadan ayaa la filayaa inay si weyn u wanaajiso saxnaanta wax-soo-saarka semiconductor, taasoo awood u siinaysa soo-saarka chips oo leh astaamo yaryar iyo waxqabad sare.
Nidaamka Lithography-ga cusub ee EUV wuxuu gaari karaa xal ilaa 1.5 nanometer, horumar la taaban karo marka loo eego jiilka hadda jira ee aaladaha lithography. Saxnimadan la xoojiyey waxay saameyn weyn ku yeelan doontaa alaabta baakadaha semiconductor. Marka ay chips-ku noqdaan kuwo yaryar oo kakan, baahida loo qabo cajaladaha xambaara ee saxda ah, cajaladaha daboolka, iyo gariirada si loo hubiyo gaadiidka badbaadada leh iyo kaydinta qaybahan yaryar ayaa kordhin doona.
Shirkadeena waxaa ka go'an inay si dhow ula socoto horumarkan tignoolajiyada ee warshadaha semiconductor. Waxaan sii wadi doonaa maalgashiga cilmi baarista iyo horumarinta si aan u horumarino agabka baakadaha kuwaas oo buuxin kara shuruudaha cusub ee ay keentay tignoolajiyada cusub ee ASML, siinta taageero la isku halayn karo ee habka wax soo saarka semiconductor.
Waqtiga boostada: Febraayo-17-2025